Products

ITO (90% In₂O₃ 10% SnO₂) Target

Purity: >99.99%
Density: ≥99.7%
Process: powder metallurgy
Ratios: 90:10 wt%; 95:5 wt%; 99:1 wt%; 85:15 wt%

Applications include transparent electrodes for displays, touch panels, and solar cells. It is also used as a transparent heating material for preventing condensation and snow buildup on windows in buildings and automobiles.

Niobium oxide (Nb₂O₅) target

Purity>99.9% *Electrically conductive
Density≧99%
HIP method

Miniaturization and high performance of optical products
Multilayer ceramic capacitors (MLCC)
LCD panels, hard disks
Thin-film formation in semiconductors, solar cells

Quartz (SiO₂) ring

Purity>99.995%
Density (2.6g/cm³)
Sintering method

Semiconductor manufacturing process
Optical equipment
Chemical laboratory equipment
Medical equipment

Vanadium oxide (V₂O₅) target

Purity > 99.9%　※Toxic
Density ≥ 85%
Vacuum sintering, HP method (Hot Pressing)

Thin film deposition for high-definition displays and optical devices
Optical coatings and sensor technology
Catalysts for organic acid production
Improved solar cell performance and efficiency

Indium antimonide (IAO) target

Purity > 99.99%
Density ≥ 85%
Sintering method
HP method (Hot Pressing method)

Antistatic coating
Also widely used in paints/coatings
Significantly reduces static charge accumulation

Tin oxide (SnO) target

Purity > 99.99%
Density ≥ 85%
Sintering method, HP method

Important materials for screen construction
Transparent electrodes enabling touchscreen operation
Anti-static film, electromagnetic wave shielding film
Transparent heater, gas sensor

Nickel oxide (NiO) target

Purity > 99.99%
Density ≥ 85%
Sintering method, HP method

Resistive Random Access Memory (RRAM)
Transparent Conductive Oxide (TCO)
Gas Sensors
Spintronics

Titanium dioxide (TiO₂) target

Titanium Oxide (TiO₂) Target
Purity > 99.9%　Conductive
Density ≥ 90%
Vacuum sintering, HP method (Hot Pressing)

High-refractive-index lenses, optical filters, semiconductors
Recording media such as hard disk drives
Thin-film formation for flat panel displays
Photocatalysts (decomposition of atmospheric nitrogen oxides, antibacterial properties)

Niobium oxide (Nb₂O₅) target

Purity > 99.9%
※Non-conductive
Density ≥ 90%
HIP method (Hot Isostatic Pressing)

Miniaturization and high performance of optical products
Multilayer ceramic capacitors (MLCC)
LCD panels, hard disks
Thin-film formation in semiconductors, solar cells

Indium oxide (In₂O₃) target

Purity > 99.99%　※Firing/sintering traces present
Density ≥ 90%
Sintering method, HP method (Hot Pressing)

LCD, OLED, plasma displays, etc.
Voltage application electrodes in touch panels
Transparent electrodes in solar cells
Anti-fogging windshields and shop windows

Aluminum oxide (AI₂O₃) target

Purity > 99.9%
Density ≥ 90%
Powder metallurgy method

Insulating films in chip manufacturing, high-performance electronic components
Sensors, solar panels, displays, etc.
Surface modification of optical devices, architectural glass
Conductive film formation, solar cell

SiO2 Particle

Purity > 99.99%
1–3 mm
Cylindrical shape

High-refractive-index lenses
Optical filters
Non-conductive layer