Niobium (Nb) target
Purity: 99.9%~99.999%
Manufacturing method: Vacuum smelting method
• Optics and displays
• Anti-reflection films are deposited by reactive sputtering.
• Nb₂O₅ has a higher refractive index than TiO₂ and is also superior in sputtering rate and stability of reactive sputtering, so it is widely used as a high-refractive-index layer in optical lenses and anti-reflection films.
• Displays: used for coating liquid crystal displays (LCDs) and flat panel displays.
Semiconductors and electronics
• Touch panels: used as Mo-Nb-Ta alloy targets for forming wiring layers and oxide layers in touch screen devices.
• Superconductivity and specialized fields
• Corrosion-resistant coatings
• Features of our targets
• Purity ≥ 3N8
• Crystal grain size: To ensure film deposition uniformity, a fine, randomly oriented recrystallized structure is regarded as important.
• Purity and shape (circular, square, rotary) can be customized according to the application, so please let us know if specific specifications are required.
