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About Us

We are not just a supplier, but a company that “creates together.”  

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Standing between manufacturers and users,we understand technical challenges and propose the best materials and processing methods.

Supporting a Wide Range of Materials and Applications

We offer a variety of sputtering target materials tailored to different applications.

Materials such as Hf (hafnium), W (tungsten), Ta (tantalum), Zr (zirconium), Cr (chromium), V (vanadium), Nd (neodymium), and AlNd (aluminum-neodymium alloy) are used in a wide range of fields, including semiconductors, communication chips, electronic devices, displays, optical components, optical thin films, surface treatment, and wear-resistant and functional coatings.

In recent years, however, export regulations and geopolitical risks have made some of these materials more difficult to obtain. Leveraging the experience we have built over the years, we support our customers in securing a stable supply of the materials they need.

(China has also tightened controls on rare-earth-related materials, leading to a growing trend toward diversifying supply sources outside China. Based on our past track record and experience, we are able to support the relatively smooth procurement and delivery of these materials.)

Addressing Challenges in Sputtering Processes

Key challenges in sputtering processes include preventing the generation of particles and arcing, maintaining deposition stability, ensuring film thickness uniformity, and achieving the desired film quality. To address these challenges, we supply sputtering targets with optimized grain size, high density, and excellent surface smoothness.

To ensure product quality and provide our customers with confidence, we conduct ultrasonic testing (UT) on all products, including both the target material and, in the case of bonded targets, the bonding area. When required, we also perform trace impurity analysis of the material using GDMS (Glow Discharge Mass Spectrometry).

Shapes and Large-Size Targets

For conventional flat targets (planar targets), we can accommodate sizes of up to 2,200 mm × 2,300 mm and also support stepped machining and other custom processing.

For rotary targets, we can accommodate dimensions of up to L 3,100 mm × OD 175 mm × ID 125 mm.

Sputtercore's Strengths

As a “Bridge of technology” and “Import/Export partner” between manufacturers and users,  we support the reliable procurement of electronic materials and metal products. 

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High Quality, Low Price

We build trust with overseas manufacturers strong technical capabilities and robust quality control systems, ensuring reliable procurement.

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Extensive Product Range

By collaborating with overseas manufacturers who maintain over 100 types of materials in stock at all times, we can flexibly meet manufacturers' needs.

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Delivery within 3 Weeks Guaranteed 

Leveraging our overseas manufacturer network, we can swiftly deliver the optimal target material.

Our Commitment to Quality

We have obtained ISO 9001, the international standard for Quality Management Systems.

We are committed to maintaining and continuously improving our quality management system to deliver products and services that our customers can trust.



>View Certificate

Certification Standard :
ISO 9001:2015

Certification Body : SGS Japan Inc.

Certification Date : June 25, 2025

Registration No. : CN26/00004591

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Spattercore Co., Ltd.

〒532‐0011

6-3-32 Nishinakajima, Yodogawa-ku, Osaka City, Osaka Prefecture

Shin-Osaka Building 2, Room 707

TEL: 06-6732-9818

FAX: 06-6732-9819

Business hours: Weekdays 9:00-17:00

Sputtercore Co., Ltd.

6-3-32 Nishinakajima, Yodogawa-ku,
Osaka 532-0011, Japan,

No.2 Shin-Osaka Bldg. Room#707

TEL: +81-6-6732-9818

FAX: +81-6-6732-9819

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ISO9001

Copyright © Sputtercore Co. Ltd. All Rights Reserved.

Certified on June 25, 2026
ISO 9001 Quality Management System

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