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Titanium (Ti) target

Purity: 99.5%~99.999%
Manufacturing method: dissolution method


• Semiconductors and electronics
• Barrier layers and adhesion layers
• Metal electrodes and seed layers
• Optical and decorative coatings
• Optical coatings: used for forming anti-reflection films for optical lenses and optical filters.
• Decorative coatings
• Tool coatings
• Features of our Ti targets
• Purity ≥ 5N
• To ensure film deposition uniformity, a fine and uniform crystal grain structure is regarded as important.
• Alloy targets: Alloy targets such as Ti-Al, Ti-Ni, Ti-Cu, and Ti-Cr are also offered.
• Please let us know if specific purity or shape specifications (circular, square, rotary) are required.

titanium-target

Spattercore Co., Ltd.

〒532‐0011

6-3-32 Nishinakajima, Yodogawa-ku, Osaka City, Osaka Prefecture

Shin-Osaka Building 2, Room 707

TEL: 06-6732-9818

FAX: 06-6732-9819

Business hours: Weekdays 9:00-17:00

Sputtercore Co., Ltd.

6-3-32 Nishinakajima, Yodogawa-ku,
Osaka 532-0011, Japan,

No.2 Shin-Osaka Bldg. Room#707

TEL: +81-6-6732-9818

FAX: +81-6-6732-9819

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ISO9001

Copyright © Sputtercore Co. Ltd. All Rights Reserved.

Certified on June 25, 2026
ISO 9001 Quality Management System

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