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Tin (Sn) target
Purity: 99.9%~99.995%
Manufacturing method: Vacuum smelting method
• Sn (tin) targets are mainly used for sputtering deposition and are utilized in fields such as transparent conductive films, EUV light sources, and solar cells.
• Raw material for transparent conductive film (ITO) targets
• Extreme ultraviolet (EUV) light sources
• They are considered promising as Sn targets in EUV light sources for next-generation semiconductor lithography.
• Solar cells
Perovskite solar cells: Research is progressing on tin oxide (SnO₂) and stannate thin films as materials for electron transport layers.
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