Tantalum (Ta) target
Purity: 99.9%~99.999%
Manufacturing method: Vacuum smelting method
• Tantalum (Ta) targets are mainly used for sputtering deposition and are utilized in fields such as semiconductor barrier layers, capacitors, and corrosion-resistant coatings.
• Semiconductors and electronics
• Barrier layers for copper wiring
• Capacitors and resistive films
• Thin-film transistors (TFTs)
• Industrial coatings and others
• Corrosion-resistant and high-temperature coatings
• Optics and medical: also used for optical coatings and the manufacture of medical device components.
• Features of our targets
• High purity (≥ 5N)
• To enhance the uniformity of fine-crystal-grain film deposition, refinement and homogenization of crystal grain size are regarded as important.
• Please let us know if specific purity or shape specifications (circular, square, etc.) are required.
