Single crystal silicon (Si) planar target

Purity>99.99999%
Density (2.33/cm³)
Manufacturing method: SZ method

It is used as a material in the manufacturing processes of integrated circuits (ICs) and large-scale integrated circuits (LSIs), as a target material for creating thin films necessary for optical devices using techniques such as sputtering, and as a component for a wide range of electronic devices such as sensors, solar cells, and transformers. It is also provided as a part for manufacturing equipment such as liquid crystal manufacturing equipment.