Hafnium (Hf) target
Purity: 99.5%~99.9%
Hf (hafnium) targets are required to have high purity, a high melting point, a high dielectric constant, and other properties.
Formation of high-k gate insulating films (e.g., HfO₂ films) in integrated circuits, transistors, and the like.
Indispensable for improving device performance and miniaturization.
Heat-resistant coatings.
Formation of thin-film coatings for optical components used in lenses, mirrors, lasers, communication equipment, etc. (We have usage records.)
Formation of thin films for high-precision sensors, environmental measurement instruments, and medical sensors.
Sputtering processes in the manufacture of thin-film transistors (TFTs) and touch panels.
Manufacture of high-performance catalysts and optimization of chemical reaction processes.
