Polycrystalline silicon (Si) ring target

Purity >99.999%
Density (2.33/cm³)
Manufacturing Method: Melting and Sintering

It is used as a component in equipment such as CVD equipment, annealing furnaces, and diffusion furnaces. It is suitable for applications requiring high purity and thermal properties, and is used as a material in sputtering deposition processes, as a component in LCD manufacturing equipment, and in the manufacture of solar panels, including thin-film silicon solar cells. Because it has lower manufacturing costs than single crystals, it is suitable for mass production and is also used in research and prototyping of microstructures such as gears, sensors, and microelectrostatic motors.