Polycrystalline silicon (Si) target

Purity >99.999%
Manufacturing method: Melting and sintering

It is used as a component for equipment such as CVD equipment, annealing furnaces, and diffusion furnaces.
It is suitable for applications requiring high purity and thermal properties, and is used as a material in sputtering film formation processes, and as a component in liquid crystal manufacturing equipment.
It is also used in the manufacture of solar panels, such as thin-film silicon solar cells.
Because production costs are lower than with single crystals, it is suitable for mass production, and is also used in research and prototyping of microstructures such as gears, sensors, and microelectrostatic motors.