Single crystal silicon (Si) target

Purity>99.99999%
Manufacturing method: SZ method

Used as a material in the manufacturing processes of integrated circuits (ICs) and large-scale integrated circuits (LSIs).
Used as a target material for creating the thin films needed for optical devices using techniques such as sputtering.
Also used as components in a wide range of electronic devices, including sensors, solar cells, and transformers.
Also supplied as parts for manufacturing equipment such as liquid crystal manufacturing equipment.