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Niobium oxide (Nb₂O₅) target

Purity > 99.9%
※Non-conductive
Density ≥ 90%
HIP method (Hot Isostatic Pressing)

Miniaturization and higher performance of optical products
Multilayer Ceramic Capacitors (MLCC)
Liquid crystal panels, hard disk drives
Semiconductor thin-film formation, solar cells

niobium-oxide-target-electrically-insulating

Spattercore Co., Ltd.

〒532‐0011

6-3-32 Nishinakajima, Yodogawa-ku, Osaka City, Osaka Prefecture

Shin-Osaka Building 2, Room 707

TEL: 06-6732-9818

FAX: 06-6732-9819

Business hours: Weekdays 9:00-17:00

Sputtercore Co., Ltd.

6-3-32 Nishinakajima, Yodogawa-ku,
Osaka 532-0011, Japan,

No.2 Shin-Osaka Bldg. Room#707

TEL: +81-6-6732-9818

FAX: +81-6-6732-9819

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ISO9001

Copyright © Sputtercore Co. Ltd. All Rights Reserved.

Certified on June 25, 2026
ISO 9001 Quality Management System

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