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Aluminum oxide (AI₂O₃) target

Purity>99.9%
Density≧90%
powder metallurgy method

半導体製造核心絶縁、導電層
集積回路IC製造に絶縁層と導電層を成膜し、回路を隔離し、干渉防止
光学デバイス、光学機能膜
太陽光発電；リチウムイオン電池にも使用

aluminum-oxide-target

Spattercore Co., Ltd.

〒532‐0011

6-3-32 Nishinakajima, Yodogawa-ku, Osaka City, Osaka Prefecture

Shin-Osaka Building 2, Room 707

TEL: 06-6732-9818

FAX: 06-6732-9819

Business hours: Weekdays 9:00-17:00

Sputtercore Co., Ltd.

6-3-32 Nishinakajima, Yodogawa-ku,
Osaka 532-0011, Japan,

No.2 Shin-Osaka Bldg. Room#707

TEL: +81-6-6732-9818

FAX: +81-6-6732-9819

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ISO9001

Copyright © Sputtercore Co. Ltd. All Rights Reserved.

Certified on June 25, 2026
ISO 9001 Quality Management System

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