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Hafnium (Hf) target

Purity: 99.5%~99.9%

Semiconductors: High-K gate dielectrics for reduced leakage current, high-bandwidth memory, aerospace (supersonic aircraft), optical coatings, sensitive materials

hafnium-target
hafnium-target-date

Semiconductors: High-K gate insulating film for reducing leakage current, high-bandwidth memory (HBM), etc.
Aerospace and supersonic aircraft heat-resistant components: High melting point, excellent high-temperature strength, and oxidation resistance
Optical coatings: High refractive index, high hardness, excellent durability and optical properties, high hardness, abrasion resistance, and oxidation resistance make them suitable for sensitive materials, such as tools

Spattercore Co., Ltd.

〒532‐0011

6-3-32 Nishinakajima, Yodogawa-ku, Osaka City, Osaka Prefecture

Shin-Osaka Building 2, Room 707

TEL: 06-6732-9818

FAX: 06-6732-9819

Business hours: Weekdays 9:00-17:00

Sputtercore Co., Ltd.

6-3-32 Nishinakajima, Yodogawa-ku,
Osaka 532-0011, Japan,

No.2 Shin-Osaka Bldg. Room#707

TEL: +81-6-6732-9818

FAX: +81-6-6732-9819

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ISO9001

Copyright © Sputtercore Co. Ltd. All Rights Reserved.

Certified on June 25, 2026
ISO 9001 Quality Management System

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