It is a high-performance sputtering material, mainly manufactured from the highly pure metal zirconium (Zr). Due to its excellent corrosion resistance, low coefficient of thermal expansion and good nuclear performance, it is widely applied in fields such as semiconductors, nuclear power, aerospace, and medical equipment.

1. Characteristics

１） High melting point and high temperature resistance

・The melting point of Zr is as high as 1852℃, making it suitable for high-temperature sputtering processes such as

PVD and CVD.

・Stable mechanical properties and chemical inertness can be maintained even in high-temperature environments.

２）Excellent corrosion resistance

・Zr has very strong resistance to corrosive agent such as acids, alkalis, and seawater, and is superior to titanium

and stainless steel.

・The surface easily forms a dense oxide film (ZrO₂), further strengthening its antioxidant capacity.

３）Low coefficient of thermal expansion

・Zr has a low coefficient of thermal expansion, making it suitable for precision optical elements and semiconductor manufacturing, and reducing cracks in thin films caused by thermal stress.

４）Low neutron absorption cross section

・Zr has an extremely low neutron absorption cross section (0.185 barn), making it an ideal material for reactor fuel casings.

５）Good biocompatibility

・Zr alloys (e.g., Zr-Nb) are non-toxic to the human body and are suitable for medical implants such as artificial joints and dental implants.

６）High purity and uniformity

・The purity of industrial-grade zirconium targets is usually ≥99.9% (3 N), and high-purity zirconium targets can reach

99.95% (3N5) or higher.

・The crystal grain size is uniform (<50 μm), ensuring the stability and consistency of thin film deposition.

2. Main Applications

１）Semiconductor and microelectronics industries

・Copper interconnect barrier layer:Zr thin film prevents copper (Cu) from diffusing into the silicon substrate,

thereby increasing the reliability of integrated circuits.

・High-k material: ZrO₂ thin film used in transistor gate structures reduces leakage current.

・Electrode materials: Electrode films used in display panels such as TFT-LCD and OLED.

２）Nuclear power industry

・Fuel coating materials : Zr alloys (e.g., Zircaloy) are used in the coating layer of nuclear reactor fuel rods, which withstand

radiation and do not affect neutron economy.

・Control rod materials: Zr alloys can be used to control the nuclear reaction rate.

３）Aerospace and high temperature coatings

・Aero engine parts: Zr alloys are used for high-temperature parts such as turbine blades and combustion chambers to 　enhance heat resistance and antioxidant properties.

・Thermal barrier coatings: ZrO₂ coatings are used to protect metal substrates from high temperature oxidation.

４）Medical equipment

・Artificial joints and dental implants: Zirconium alloys (e.g., Zr-Ti, Zr-Nb) have excellent wear resistance and biocompatibility.

・X-ray targets: Used in medical imaging equipment and provide a stable radiation source.

５）Optical and optoelectronic fields

・Anti-reflective film and high refractive index film : ZrO₂ film is used in optical lenses, lasers, and AR/VR devices to 

improve transmittance.

・Transparent conductive films : Used in displays, solar cells, and other optoelectronic devices.