<Single Crystal Silicon Target> 

High purity, high crystalline quality silicon material, mainly used in semiconductor, photovoltaic, optical film and scientific research fields.

Main applications 

1) Semiconductor manufacturing 

・Integrated circuits (IC) and microelectronic devices 

・Used to deposit silicon-based conductive or sacrificial layers in advanced processes such as FinFET and GAA transistors.

・Silicide film 

・Reacts with metals (Ti, Co, Ni, etc.) to produce silicide (TiSi₂, CoSi₂, etc.) to reduce contact resistance and improve device 　performance.

(2) Solar cells 

・Thin-film solar cells** 

・PVD (magnetron sputtering) or CVD (chemical vapor deposition) used for the absorber or window layer of silicon-based 　thin film solar cells to produce amorphous silicon (a-Si) or microcrystalline silicon (μc- Si) thin film by PVD (magnetron 　sputtering) or CVD (chemical vapor deposition).

　In perovskite solar cells, it can be used as a material source for the electron transport layer (ETL) or buffer layer.

3) Optical coatings 

・Infrared optical elements 

・Anti-reflective coatings 

4) Display technology 

・OLED flexible displays 

・The process of depositing silicon thin films to drive thin-film transistors in back plates.