<Polycrystal silicon target> 

It is an important sputtering plating material and widely applied in semiconductor, photovoltaic, optical and electronic devices.

Features 

1) High Purity 

・Purity is usually ≥99.999% (5 N), and some high-end applications (e.g. semiconductors) require higher (e.g. 6 N to 9 N).

・Impurity content is extremely low to ensure the stability of electrical properties of sputtered thin films.

(2) Good electrical conductivity and semiconductor properties 

・It has semiconductor properties, and the resistivity can be adjusted by doping with boron, phosphorus, etc.

　Suitable for manufacturing conductive layers for integrated circuits (ICs) and photovoltaic cells.

(3) Thermal stability and chemical inertness 

・Melting point is 1410℃, boiling point is 2355℃, and it remains stable at high temperatures.

・Chemical properties are stable at room temperature and acid resistant (except HF + HNO 8323 mixed acid).

(4) Grain uniformity 

・Oriented solidification or chemical vapor deposition (CVD) process can be employed to control grain size and improve 　sputter uniformity.

5) Mechanical performance 

・Brittle and easily cracked at room temperature, but ductile at high temperatures (>800℃).

2. Main applications 

1) Semiconductor and microelectronics industry 

・Used to manufacture critical components such as integrated circuits (ICs), transistors and memory.

・Used as a base material for transparent conductive oxide (TCO) thin films for TFT-LCD and OLED displays.

2) Solar cells 

・Photo absorbing or buffer layer for thin film solar cells such as HIT cells.

Market share as an important raw material for polycrystalline silicon solar cells is over 90%.

3) Optical coatings 

・Used in plating films for Low-E glass (architectural energy-saving glass) to increase infrared reflectance.

・ Function as transmissive film or protective layer in devices such as optical lenses and infrared windows.

4) Information storage and optoelectronic devices 

・Thin film deposition for hard disk storage media and optical communication devices.

・Important material in the manufacture of LEDs and lasers.