A high-purity alloy sputtering target consisting of nickel (Ni) and vanadium (V), mainly used in thin film deposition processes such as magnetron sputtering (PVD) and electron beam deposition. Its unique composition and performance make it an important part of the semiconductor, electronics, aerospace, and photovoltaic industries.
1. Characteristics
1)High purity and low impurity
・The purity of industrial NiV targets is typically ≥99.9%, and can reach 99.99% or higher for high-end applications such as semiconductors.
・Strictly controlled impurities (e.g. Fe, Al, Si, C, N, O, S, etc.), some impurities ≤10 ppm for some applications,
and even U, Th≤1 ppb.
2)Excellent barrier performance
・In integrated circuits, NiV alloys can act as both an adhesive layer (Ni) and a barrier layer (V) to prevent the formation of low-melting AuSi compounds between gold (Au) and silicon (Si) and improve interface stability.
3)Low magnetism suitable for magnetron sputtering
・The alloy has weak ferromagnetism, which reduces abnormal discharges during sputtering and improves thin film uniformity.
4)High density and uniform microstructure
・Vacuum in-vacuum melting (VIM/VAR) or hot isostatic pressing (HIP) process ensures no pores in the target material and fine crystal grains (≤100 μm), which increases sputtering efficiency.
5)High temperature resistance and corrosion resistance
・The addition of vanadium enhances the alloy's high-temperature resistance performance, making it suitable for high-temperature environments above 650°C (e.g., aero engine coatings).
2. Main Applications
1)Semiconductors and integrated circuits.
2)Photovoltaics.
3)Aerospace and high temperature coatings.
・Protective coatings for high temperature components such as turbine blades and nozzles in aero engines, resisting high temperature oxidation and thermal corrosion.
4)Optics and display technology
・Used in Low-E (low emissivity) glass coatings to improve thermal insulation and light transmission.
・Improved conductivity and optical properties in touch panels (ITO glass).
5)Nuclear and energy industry
・Used in nuclear reactor components with high radiation resistance and high temperature strength requirements.
・Provide corrosion resistance protection for petrochemical plants such as high temperature piping and valves.
株式会社ターゲットテック
大阪府大阪市淀川区西中島6丁目3番32号
第2新大阪ビル 707号室
TEL: 06-6-6732-9818
FAX: 06-6-6732-9819
MAIL: ken@ttcm.co.jp
Target-Tech Co. Ltd.
6-3-32 Nishinakajima, Yodogawa-ku, Osaka 532-0011, Japan,
No.2 Shin-Osaka Bldg. Room#707
TEL: +81-6-6732-9818
FAX: +81-6-6732-9819
MAIL: ken@ttcm.co.jp