An important sputtering material, widely applied in fields such as semiconductors, optics, and magnetic materials due to its excellent physical and chemical performance.
1. Characteristics
1) High Purity and high density
The purity of Ni target is usually ≥99.9% (4 N grade) and partially reaches 99.995% (4 N 5), ensuring high quality of thin film deposition.
・High density (>99%) and uniform crystal grains (average grain size <20 μm) are advantageous for uniformity and stability of sputter deposition.
2) Excellent electrical and thermal conductivity
・The electrical conductivity is about 14.3 x 10 x 10 x S/m, which is suitable for the production of conductive thin films in the electronics field.
・Thermal conductivity of 90-100 W/(m・K) helps heat dissipation during sputtering and prevents overheating of the target.
3) Good corrosion resistance and anti-oxidation properties
・The target does not easily react with air, acid, or alkali at room temperature, and is highly resistant to chemical corrosion.
4) Ferromagnetism and magnetic stability
・Ni is ferromagnetic and has a Curie temperature of about 360°C, making it suitable for magnetic storage device, sensors,
and other applications.
5) Excellent processing performance
・It can be processed into various shapes such as flat targets, rotating targets, and odd-shaped targets, making it suitable
for various types of film deposition.
2. Main Applications
1)Semiconductor and microelectronics industries
・Conductive layers, welding layers, and magnetic thin film elements for manufacturing integrated circuits.
2)Optical coatings and display industry
・Low-E glass, automotive coatings, and AR/AR coatings to increase light transmittance and weather resistance.
3)Magnetic memory and sensors
・Thin film deposition for magnetic devices such as hard disk drives, magnetic storage device, and magnetic sensors.
4)Solar Cells and Photovoltaic Industry
・Improvement of photoelectric conversion efficiency as a component of transparent conductive oxide (TCO).
5)Decorative and tool coatings
・Used on surfaces of automotive parts, jewelry, cutlery, etc. to enhance wear resistance and aesthetics.
6)Chemical catalysts and fuel cells
・Used as catalysts or electrode materials to promote hydrogenation reactions and improve fuel cell performance.
株式会社ターゲットテック
大阪府大阪市淀川区西中島6丁目3番32号
第2新大阪ビル 707号室
TEL: 06-6-6732-9818
FAX: 06-6-6732-9819
MAIL: ken@ttcm.co.jp
Target-Tech Co. Ltd.
6-3-32 Nishinakajima, Yodogawa-ku, Osaka 532-0011, Japan,
No.2 Shin-Osaka Bldg. Room#707
TEL: +81-6-6732-9818
FAX: +81-6-6732-9819
MAIL: ken@ttcm.co.jp