Sputtering target consisting of high-purity chromium (Cr).

It is mainly used in physical vapor deposition (PVD) processes such as magnetron sputtering and electron beam deposition to produce chromium thin films or alloy coatings.

1. Characteristics

1) Physical Characteristics

  ・High melting point

  ・High hardness

  ・Excellent thermal conductivity

  ・Chemical properties

  ・Excellent corrosion resistance

  ・Good electrical conductivity

2. Main Applications

1) Semiconductor and microelectronics industries

・Integrated circuit (IC) conductive pathway

  Lithography mask plates: Chromium films are used in lithography processes due to their high resolution and high contrast.

2) Photovoltaic industry

3）Decorative and protective coatings

4) Automotive components

5) Architecture and interior decoration

6) Industrial wear-resistant coatings

7) Optical and display technology