An important sputtering material, it is made from high-purity metal Co and widely applied in many high-tech fields due to its unique magnetic energy, corrosion resistance and high temperature stability.
1. Characteristics
1)Excellent magnetic energy
・Ferromagnetism: Co is ferromagnetic and has a Curie temperature as high as 1121°C, much higher than iron (770°C)
and nickel (360°C).
・High magnetic crystal anisotropy: Co is suitable for high-density magnetic recording media and magnetic sensors.
2)High melting point and high temperature resistance
・Melting point up to 1495°C, suitable for high temperature sputtering process.
Maintains good mechanical strength and chemical stability at high temperatures.
3)High corrosion resistance
・High resistance to corrosive agent such as acids and alkalis at room temperature.
・The surface easily forms a dense oxide film (CoO/Co 8323 O 8324), which enhances its antioxidant capacity.
4)High purity and uniformity
・The purity of industrial grade Co target is usually ≥99.9% (3 N), and high purity Co target can reach 99.99% (4 N) or higher.
・Uniform crystal grain size (<30 μm) ensures stability and uniformity of thin film deposition.
5) Good electrical and thermal conductivity
・The electrical conductivity is about 1.6 x 10 x S/m, making it suitable for the production of conductive thin films in the
electronics industry.
・Thermal conductivity of about 100 W/(m-K), which helps heat dissipation during sputtering.
2. Main Applications
1)Magnetic memory and sensors
・Hard disk drive (HDD): Used for thin-film deposition of magnetic storage device to increase storage density.
・Magnetic random memory (MRAM): Ferromagnetic layer material used in next-generation nonvolatile memory.
・Magnetic sensors: Hall sensors, magnetoresistive sensors for automotive, and industrial inspection.
2)Semiconductor and microelectronics
・Copper Interconnect Barrier Layer: Co thin film prevents copper (Cu) from diffusing into the silicon substrate, thereby increasing the reliability of integrated circuits.
・Electrode materials: Contact layer and interconnect materials for high-end process chips.
3)New Energy and Battery Technologies
・Lithium-ion batteries: Co oxides such as LiCoO₂ are important components of cathode materials to increase the energy density of batteries.
・Fuel cells: Co-based catalysts are used in the oxygen reduction reaction (ORR) to improve fuel cell performance.
4)Optical and optoelectronic fields
・Anti-reflective and highly reflective films: Co films are used as reflective layers in optical devices and solar cells.
・Transparent conductive films : Co-doped oxide films for displays and touch screens.
5)Industrial Coatings and Tool Coatings
・Anti-wear coatings: Used to extend the usage life of tools and dies.
・Anti-corrosion layer : Co alloy layer is used for chemical industry facilities and marine works to increase corrosion resistance.
6)Medical and biological materials
・Medical implants: Co chromium alloys (e.g. CoCrMo) are used for artificial joints and dental implants, and have excellent
wear resistance and biocompatibility.
・MRI contrast agents: Co-based nanoparticles contrast enhancement for magnetic resonance imaging (MRI).
株式会社ターゲットテック
大阪府大阪市淀川区西中島6丁目3番32号
第2新大阪ビル 707号室
TEL: 06-6-6732-9818
FAX: 06-6-6732-9819
MAIL: ken@ttcm.co.jp
Target-Tech Co. Ltd.
6-3-32 Nishinakajima, Yodogawa-ku, Osaka 532-0011, Japan,
No.2 Shin-Osaka Bldg. Room#707
TEL: +81-6-6732-9818
FAX: +81-6-6732-9819
MAIL: ken@ttcm.co.jp